Fouquet 表示 NXE:3800 生产率提升推动 EUV 单次曝光取代多重图形,提高光刻强度,尤其是在 DRAM 领域。
生产率的提升使我们能够与客户一起降低技术成本,因此我们开始看到更多采用 EUV 单次曝光的机会,当然是以取代多重图形为代价。这对客户很好,因为有助于缩短周期、简化流程和提升良率;对 ASML 而言,这意味着光刻强度,尤其是 DRAM 的光刻强度持续增加。原文 (en)
the progress on productivity basically allow us to execute with our customer on cost of technology and as a result we start to see the opportunity to have more EUV V single expose adoption uh of course at the expense of multiatterning. This is great for our customer because it helps with cycle time simplification yield and of course for SML this means that this little intensity especially for DM now is uh continuing to increase