Fouquet称NXE 3800的高产能使客户(尤其DRAM)以EUV单次曝光替代多重曝光,提升光刻强度。
由于更高的生产率,这款设备让客户能把更多多重曝光层转为单次曝光,从而降低复杂度、减少良率损失、缩短周期。过去几个月我们在DRAM上看到很多这样的情况,最新节点明显转向更多EUV层。原文 (en)
this tool uh thanks to the higher productivity really allow customer to shift more multiatterning layer to single expose. So this basically allow a customer to reduce complexity, reduce uh yield loss, improve cycle time and we have seen that happening quite a bit uh in the last few months with DM where for the last nodes we really see a shift basically towards more EUV layer